The Critical Role of Molecular Sieves in Electronic Gas Purification

Electronic gases are core materials in industries such as integrated circuits, display panels, LEDs, and photovoltaics. They are widely used in key processes like cleaning, etching, chemical vapor deposition (CVD), and ion implantation. As semiconductor technology evolves toward smaller nodes (below 3 nm) and higher performance, the purity requirements for electronic gases have become increasingly stringent, with impurity levels required to be controlled down to ppb or even ppt levels.

Among many purification technologies, molecular sieves play a pivotal role in the purification of Electronic Specialty Gases (ESGs) due to their unique microporous structure and excellent adsorption performance. Their pore sizes can be precisely tuned for specific functions, for example:

● 3A (0.3 nm): Specialized for deep dehydration. Suitable for moisture-sensitive gases like silane (SiH₄) and ammonia (NH₃), capable of reducing moisture content to below ppb levels and preventing hydrolysis-induced particle formation that can clog pipelines.

● 4A (0.4 nm): In addition to water, it can adsorb CO₂. Commonly used in purifying high-purity nitrogen (N₂) and argon (Ar), ensuring extremely low levels of O₂ and CO₂ in protective gases to avoid oxidation during semiconductor processes.

●  13X (1.0 nm) and modified molecular sieves: By incorporating metals (such as Cu, Ag) or surface treatments, these can remove O₂, CO₂, hydrocarbons (THC), and nitrogen oxides (NOₓ), making them ideal for purifying corrosive gases like WF₆ and NF₃.

In practical applications, molecular sieves are often used in combination with catalytic purification and cryogenic adsorption to form multistage purification systems. For instance, in NF₃ purification, chemical adsorbents remove HF before 13X sieves eliminate residual moisture. In laser gases (like F₂/Ne blends), modified molecular sieves efficiently remove hydrocarbons to ensure the cleanliness of EUV lithography systems.

With the rise of third-generation semiconductors (SiC, GaN) and advanced packaging technologies, JOOZEO’s molecular sieves will continue evolving toward higher selectivity, lower dust generation, and longer service life to meet increasing demands in electronic gas purification.